The Engstrom Research Group’s publication was selected as an Editor’s Pick for the Journal of Vacuum Science & Technology A
The Engstrom Research Group’s most recent publication, published online on November 9, and entitled “Area-selective atomic layer deposition enabled by competitive adsorption,” was selected as an Editor’s Pick for the Journal of Vacuum Science & Technology A. This manuscript appeared as part of a Special Topic Collection on Area Selective Deposition, and the authors were Taewon Suh, Yan Yang, Hae Won Sohn, Robert A. DiStasio Jr., and James R. Engstrom. This work was a collaboration between the Engstrom and DiStasio Groups and involved the use of both experiments and calculations to demonstrate... Read more