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The Engstrom Research Group’s publication was selected as an Editor’s Pick for the Journal of Vacuum Science & Technology A
The Engstrom Research Group’s most recent publication, published online on November 9, and entitled “Area-selective atomic layer deposition enabled by competitive adsorption,” was selected as an Editor’s Pick for the Journal of Vacuum Science & Technology A. This manuscript appeared as part of a Special Topic Collection on Area Selective Deposition, and the authors were Taewon Suh, Yan Yang, Hae Won Sohn, Robert A. DiStasio Jr., and James R. Engstrom.
This work was a collaboration between the Engstrom and DiStasio Groups and involved the use of both experiments and calculations to demonstrate the effective use of competitive adsorption to achieve composition dependent (Cu vs. SiO2)/area selective ALD. As of November 23, a two-week period, their manuscript has been viewed 500 times.