CBE graduate student Alexandra M. Cooper has been awarded an IBM PhD Fellowship
CBE graduate student Alexandra M. Cooper has been awarded an extremely competitive IBM Ph.D. Fellowship for her work on the simulation of low-k dielectric materials for use in "back-end" processes to create next-generation semiconductor devices. The development of improved low-k materials has focused on introducing porosity into SiCOH-based films in order to lower the dielectric constant. But the increased porosity in these films reduces the material’s mechanical strength, creating significant integration challenges. Cooper’s research uses atomistic computer simulation techniques to better understand the link between novel processing techniques and the resulting SiCOH structures that will lead to a lower dielectric constant with minimal weakening of mechanical strength.