Seminar: Karen K. Gleason, MIT
Professor Karen K. Gleason of MIT presents a seminar in Chemical & Biomolecular Engineering, "Designing Novel Devices with Chemically Vapor Deposited (CVD) Polymers."
Abstract: Chemical Vapor Deposition (CVD) methods significantly augment the capabilities of traditional surface modification techniques for fabricating polymeric surfaces. In CVD polymerization, the monomer(s) are delivered to the surface through the vapor phase and then undergo simultaneous polymerization and thin film formation. By eliminating the need to dissolve macromolecules, CVD enables insoluble polymers to be coated and prevents solvent damage to the substrate. Since de-wetting and surface tension effects are absent, CVD coatings conform to the geometry of the underlying substrate. Hence, CVD polymers can be readily applied to virtually any substrate: organic, inorganic, rigid, flexible, planar, three-dimensional, dense, or porous. CVD methods integrate readily with other vacuum processes used to fabricate patterned surfaces and devices. CVD film growth proceeds from the substrate up, allowing for interfacial engineering, real-time monitoring, and thickness control. The ability to grow grafted layers and directly integrate them into devices, including photovoltaic arrays and low power sensors, will be demonstrated for responsive polymers and electrically conducting polymers.