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Yong Joo: Solid State Processing of Advanced Polymeric Materials

Finally, we are interested in understanding solid state processing (at temperatures lower than the melting point of a polymer) of polymeric materials for economic production with enhanced material properties. Although many attempts to apply the concept of solid state processing to many polymeric systems have been made for several decades, the practical impact of the process has been rather insignificant, because the lack of productivity seems to be inherently imbedded in the process. The interplay between material preparation and process development is the key here, and one good example of this interplay in solid state processing is the synthesis of ultra high molecular weight polyethylene (UHMWPE) for which the yield is high even at relatively low polymerization temperatures (Figs. 14 and 15). Such UHMWPE nascent reactor powders can directly be processed to continuous multi-stage orientation drawing to produce high strength, high modulus materials or microporous membranes (Figs. 16 and 17). Finite element analysis of solid-state drawing, which incorporates stress induced crystallization and morphology evolution, is applied to predict the structure and properties of the product.

figure 14

Fig. 14 Scanning Electron Microscopy photographs of various UHMWPE powders polymerized at different reaction conditions. a) GUR412 (by Ticona), b) at 10 C under 15 psia, c) at 30 C under 15 psia, and d) at 90 C under 15 psia.

figure 15

Fig. 15 The WAXS patterns of various UHMWPE powders at room temperature. Plots synthesized under various conditions. That of GUR412 is also shown for comparison.

figure 16

Fig. 16 The forming rolls suitable for use in the practice for the formation of monolithic tape of UHMWPE

figure 17

Fig. 17 The changes in the SAXS patterns of UHMWPE filaments made from UHMWPE powder synthesized at 30 C under 15 psia with increasing draw ratio.

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340 Olin Hall
Cornell University
Ithaca, NY 14853
Phone: (607) 255-8591
Email: ylj2@cornell.edu

 

 

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